activity
19992023
most citedTimesaving Double-Grid Method for Real-Space Electronic-Structure Calculations

216 citations · 908 across the 47 of their papers we have counts for

collaborators

47 papers

cond-mat.mtrl-sci2023★ 1 cited

Density functional theory study on effect of NO annealing for SiC(0001) surface with atomic-scale steps

Mitsuharu Uemoto, Nahoto Funaki, Kazuma Yokota +2

Density functional theory calculations for the electronic structures of the 4H-SiC(0001)/SiO interface with atomic-scale steps are carried out to investigate the effect of NO a…

cond-mat.mes-hall2023

Valley filters using graphene blister defects from first principles

Mitsuharu Uemoto, Masaki Nishiura, Tomoya Ono

Valleytronics, which makes use of the two valleys in graphenes, attracts considerable attention and a valley filter is expected to be the central component in valleytronics. We pro…

cond-mat.mtrl-sci2022★ 3 cited

Density functional theory calculations for investigation of atomic structures of 4H-SiC/SiO interface after NO annealing

Naoki Komatsu, Mizuho Ohmoto, Mitsuharu Uemoto +1

We propose the atomic structures of the 4H-SiC/SiO interface for the , , C, and Si faces after NO annealing. Our proposed structures preferentially form at the topmost la…

cond-mat.mtrl-sci2022★ 2 cited

Theoretical investigation of vacancy related defects at 4H-SiC(000)/SiO interface after wet oxidation

Mukai Tsunasaki, Tomoya Ono, Mitsuharu Uemoto

The stability and formation mechanism of the defects relevant to silicon and carbon vacancies at the 4H-SiC(000)/SiO interface after wet oxidation are investigated by…

cond-mat.mtrl-sci2022★ 8 cited

Density functional study of twisted graphene -FePd heterogeneous interface

Mitsuharu Uemoto, Hayato Adachi, Hiroshi Naganuma +1

Graphene on -FePd(001), which has been experimentally studied in recent years, is a heterogeneous interface with a significant lattice symmetry mismatch between the honeycomb…

cond-mat.mtrl-sci2020

First-principles study on structure and anisotropy of high N-atom density layer in 4H-SiC

Mitsuharu Uemoto, Naoki Komatsu, Yoshiyuki Egami +1

A nitridation annealing process is well employed to reduce interface trap states that degrade the channel mobility of 4H-SiC/SiO metal-oxide-semiconductor field-effect transi…