3 papers
cs.LG2026
Gradient-based inverse lithography for EUV masks via the waveguide method and a physics-informed neural operator
Vasiliy A. Es'kin, Egor V. Ivanov
Gradient-based inverse lithography technology~(ILT) for extreme ultraviolet~(EUV) masks is presented. A novel framework treats the differentiable waveguide method and the recently…
cs.LG2026
Physics-Informed Neural Systems for the Simulation of EUV Electromagnetic Wave Diffraction from a Lithography Mask
Vasiliy A. Es'kin, Egor V. Ivanov
Physics-informed neural networks (PINNs) and neural operators (NOs) for solving the problem of diffraction of Extreme Ultraviolet (EUV) electromagnetic waves from contemporary lith…
math.NA2025
Physics-informed neural networks and neural operators for a study of EUV electromagnetic wave diffraction from a lithography mask
Vasiliy A. Es'kin, Egor V. Ivanov
Physics-informed neural networks (PINNs) and neural operators (NOs) for solving the problem of diffraction of Extreme Ultraviolet (EUV) electromagnetic waves from a mask are presen…