most citedSEMI-DiffusionInst: A Diffusion Model Based Approach for Semiconductor Defect Classification and Segmentation

2 citations · 6 across the 5 of their papers we have counts for

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cs.CV20242 cited

Addressing Class Imbalance and Data Limitations in Advanced Node Semiconductor Defect Inspection: A Generative Approach for SEM Images

Bappaditya Dey, Vic De Ridder, Victor Blanco +2

Precision in identifying nanometer-scale device-killer defects is crucial in both semiconductor research and development as well as in production processes. The effectiveness of ex…

cs.CV2024

Towards Improved Semiconductor Defect Inspection for high-NA EUVL based on SEMI-SuperYOLO-NAS

Ying-Lin Chen, Jacob Deforce, Vic De Ridder +4

Due to potential pitch reduction, the semiconductor industry is adopting High-NA EUVL technology. However, its low depth of focus presents challenges for High Volume Manufacturing.…

cs.CV2023

Improved Defect Detection and Classification Method for Advanced IC Nodes by Using Slicing Aided Hyper Inference with Refinement Strategy

Vic De Ridder, Bappaditya Dey, Victor Blanco +2

In semiconductor manufacturing, lithography has often been the manufacturing step defining the smallest possible pattern dimensions. In recent years, progress has been made towards…

cs.CV20232 cited

SEMI-DiffusionInst: A Diffusion Model Based Approach for Semiconductor Defect Classification and Segmentation

Vic De Ridder, Bappaditya Dey, Sandip Halder +1

With continuous progression of Moore's Law, integrated circuit (IC) device complexity is also increasing. Scanning Electron Microscope (SEM) image based extensive defect inspection…

cs.CV20232 cited

SEMI-CenterNet: A Machine Learning Facilitated Approach for Semiconductor Defect Inspection

Vic De Ridder, Bappaditya Dey, Enrique Dehaerne +3

Continual shrinking of pattern dimensions in the semiconductor domain is making it increasingly difficult to inspect defects due to factors such as the presence of stochastic noise…