most citedAdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns

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cs.CV2023★ 1 cited

AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns

Wenqian Zhao, Xufeng Yao, Ziyang Yu +4

Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine…