Evolution of ferroelectricity with annealing temperature and thickness in sputter deposited undoped HfO${}_2$ on silicon

Md Hanif Ali, Adityanarayan Pandey, Rowtu Srinu +4

Ferroelectricity in sputtered undoped-HfO${}_2$ is attractive for composition control for low power and non-volatile memory and logic applications. Unlike doped HfO${}_2$, evolution of…