most citedPushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source

2 citations · 3 across the 2 of their papers we have counts for

collaborators

2 papers

cond-mat.mtrl-sci2024★ 1 cited

Molecular Beam Epitaxy Growth and Doping Modulation of Topological Semimetal NiTe

Liguo Zhang, Dapeng Zhao, Xiangyang Liu +6

In this study, high-quality thin films of the topological semimetal phase NiTe were prepared using molecular beam epitaxy (MBE) technique, confirmed through X-ray diffraction w…

physics.optics2022★ 2 cited

Pushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source

Xuefeng Yang, Shuxia Zhang, Baoji Wang +5

Limited by the cost and complexity, superresolution lithography is hard to achieve through the traditional interference lithography. We here developed the plasmonic interference li…