most citedPushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source

2 citations · 2 across the 1 of their papers we have counts for

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1 paper

physics.optics2022★ 2 cited

Pushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source

Xuefeng Yang, Shuxia Zhang, Baoji Wang +5

Limited by the cost and complexity, superresolution lithography is hard to achieve through the traditional interference lithography. We here developed the plasmonic interference li…