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R. Lo Nigro

2 papers hereh-index 13528 citations44 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author1
  • middle author1

Across the 2 of 2 papers where every author was matched, so the position is known.

fields
  • physics.app-ph2

identity via Semantic Scholar / OpenAlex

most citedNanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices

27 citations · 41 across the 2 of their papers we have counts for

collaborators

2 papers

physics.app-ph2022★ 14 cited

Electrical evolution of W and WC Schottky contacts on 4H-SiC at different annealing temperatures

Marilena Vivona, Gabriele Bellocchi, Raffaella Lo Nigro +2

In this paper, we investigate the electrical evolution of tungsten (W) and tungsten carbide (WC) Schottky contacts on 4H-SiC subjected to thermal treatments at different annealing…

physics.app-ph2020★ 27 cited

Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices

Raffaella Lo Nigro, Emanuela Schilirò, Patrick Fiorenza +1

Nanolaminated Al2O3/HfO2 thin films as well as single Al2O3 and HfO2 layers have been grown as gate dielectrics by Plasma Enhanced Atomic Layer Deposition (PEALD) technique on sili…

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