29 citations · 29 across the 3 of their papers we have counts for
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Non-invasive monitoring of process-relevant plasma parameters by Fiber PROES in capacitively coupled Ar/CF plasmas
Florian Beckfeld, Maximilian Ryppa, Constantin Neuroth +3
Monitoring changes of process-relevant plasma parameters, such as the electron density and ion flux to the wafer, is essential for the development and control of plasma processes.…
Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
Jonas Giesekus, Anton Pletzer, Florian Beckfeld +3
Precise control of ion energy distribution functions (IEDF) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In t…
Computational study of simultaneous positive and negative streamer propagation in a twin surface dielectric barrier discharge via 2D PIC simulations
Q. Zhang, R. T. Nguyen-Smith, F. Beckfeld +4
The propagation mechanisms of plasma streamers have been observed and investigated in a surface dielectric barrier discharge (SDBD) using 2D particle in cell simulations. The inves…