2 papers
cond-mat.mtrl-sci2024
Reproducible Monolayer MoS2 Devices Free of Resist Contamination by Gold Mask Lithography
Yumeng Liu, Yizhuo Wang, Zhengfang Fan +4
Atomically thin MoS2 is a promising material for field-effect transistors (FETs) and electronic devices. However, traditional photolithographic processes introduce surface contamin…
cond-mat.mes-hall2024
High Performance MoS2 Phototransistors Photogated by PN Junction
Seyed Saleh Mousavi Khaleghi, Jianyong Wei, Yumeng Liu +4
Photodetectors based on two-dimensional (2D) atomically thin semiconductors suffer from low light absorption, limiting their potential for practical applications. In this work, we…