3 papers
cs.OH2018
Standard Cell Library Evaluation with Multiple lithography-compliant verification and Improved Synopsys Pin Access Checking Utility
Yongfu Li, Wan Chia Ang, Chin Hui Lee +3
While standard cell layouts are drawn with minimum design rules to maximize the benefit of design area shrinkage, the complicated design rules have caused difficulties with signal…
cs.OH2018
Multiple-Lithography-Compliant Verification for Standard Cell Library Development Flow
Yongfu Li, Wan Chia Ang, Chin Hui Lee +3
Starting from 22-nm, a standard cell must be designed to be full lithography-compliant, which includes Design Rule Check, Design-for-Manufacturability and Double-Patterning complia…
cs.OH2018
Constraining the Synopsys Pin Access Checker Utility for Improved Standard Cells Library Verification Flow
Yongfu Li, Chin Hui Lee, Wan Chia Ang +3
While standard cell layouts are drawn with minimum design rules for maximum benefit of design area shrinkage, the complicated design rules begin to cause difficulties with signal r…