5 papers
Creation and Fixing of Lithography Hotspots with Synopsys Tools
I-Lun Tseng, Valerio Perez, Yongfu Li +3
At advanced process nodes, pattern matching techniques have been used in the detection of lithography hotspots, which can affect yields of manufactured integrated circuits. Althoug…
Standard Cell Library Evaluation with Multiple lithography-compliant verification and Improved Synopsys Pin Access Checking Utility
Yongfu Li, Wan Chia Ang, Chin Hui Lee +3
While standard cell layouts are drawn with minimum design rules to maximize the benefit of design area shrinkage, the complicated design rules have caused difficulties with signal…
Multiple-Lithography-Compliant Verification for Standard Cell Library Development Flow
Yongfu Li, Wan Chia Ang, Chin Hui Lee +3
Starting from 22-nm, a standard cell must be designed to be full lithography-compliant, which includes Design Rule Check, Design-for-Manufacturability and Double-Patterning complia…
Advanced In-Design Auto-Fixing Flow for Cell Abutment Pattern Matching Weakpoints
Yongfu Li, Valerio Perez, I-Lun Tseng +4
Pattern matching design verification has gained noticeable attention in semiconductor technologies as it can precisely identify more localized problematic areas (weakpoints) in the…
Constraining the Synopsys Pin Access Checker Utility for Improved Standard Cells Library Verification Flow
Yongfu Li, Chin Hui Lee, Wan Chia Ang +3
While standard cell layouts are drawn with minimum design rules for maximum benefit of design area shrinkage, the complicated design rules begin to cause difficulties with signal r…