Uniform vapor pressure based CVD growth of MoS2 using MoO3 thin film as a precursor for co-evaporation

Sajeevi S. Withanage, Hirokjyoti Kalita, Hee-Suk Chung +3

Chemical vapor deposition (CVD) is a powerful method employed for high quality monolayer crystal growth of 2D transition metal dichalcogenides with much effort invested toward impr…