An Instrument for Precision Controlled Radiation Exposures, Charged Beam Profile Measurement, and Real-time Fluence Monitoring Beyond $10^{16}$ n${}_{\text{eq}}$/cm${}^2$

M. R. Hoeferkamp, J. S. T. Wickramasinghe, A. Grummer +2

An instrument has been developed for precision controlled exposures of electronic devices and material samples in particle beams. The instrument provides simultaneously a real time…