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A. Cohen

1 paper hereh-index 4157 citations7 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author1

Across the 1 of 1 paper where every author was matched, so the position is known.

fields
  • physics.app-ph1
same name
  • A. Cohen — 52 papers, h 17
  • A. Cohen — 24 papers, h 40
  • A. Cohen — 19 papers, h 7
  • A. Cohen — 12 papers, h 6
  • A. Cohen — 11 papers, h 40
  • A. Cohen — 11 papers, h 22

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

most citedGrowth-Etch Metal-Organic Chemical Vapor Deposition Approach of WS2 Atomic-Layers

1 citations · 1 across the 1 of their papers we have counts for

collaborators

1 paper

physics.app-ph2020★ 1 cited

Growth-Etch Metal-Organic Chemical Vapor Deposition Approach of WS2 Atomic-Layers

Assael Cohen, Avinash Patsha, Pranab K. Mohapatra +5

Metal organic chemical vapor deposition (MOCVD) is one of the main methodologies used for thin film fabrication in the semiconductor industry today and is considered one of the mos…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.