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20182025
most citedDemonstration of a MOT in a Sub-Millimeter Membrane Hole

2 citations · 2 across the 1 of their papers we have counts for

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cond-mat.mtrl-sci2025

A reduced-temperature process for preparing atomically clean Si(100) and SiGe(100) surfaces with vapor HF

Luis Fabián Peña, Evan M. Anderson, John P. Mudrick +4

Silicon processing techniques such as atomic precision advanced manufacturing (APAM) and epitaxial growth require surface preparations that activate oxide desorption (typically >10…