2 papers
physics.plasm-ph2023
Particle charging during pulsed EUV exposures with afterglow effect
M. Chaudhuri, L. C. J. Heijmans, M. van de Kerkhof +3
The nanoparticle charging processes along with background spatial-temporal plasma profile have been investigated with 3DPIC simulation in a pulsed EUV exposure environment. It is f…
physics.plasm-ph2020
Plasma-assisted Discharges and Charging in EUV-induced Plasma
Mark van de Kerkhof, Andrei M. Yakunin, Vladimir Kvon +4
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…