Dongheon Lee

collaborators

2 papers

cond-mat.mtrl-sci2025

Etching-to-deposition transition in SiO $_{2}$ /Si $_{3}$ N $_{4}$ using CH $_{x}$ F $_{y}$ ion-based plasma etching: An atomistic study with neural network potentials

Hyungmin An, Sangmin Oh, Dongheon Lee +4

Plasma etching, a critical process in semiconductor fabrication, utilizes hydrofluorocarbons both as etchants and as precursors for carbon film formation, where precise control ove…

physics.comp-ph2019

Atomic energy mapping of neural network potential

Dongsun Yoo, Kyuhyun Lee, Wonseok Jeong +2

We show that the intelligence of the machine-learning potential arises from its ability to infer the reference atomic-energy function from a given set of total energies. By utilizi…

Etching-to-deposition transition in SiO2​/Si3​N4​ using CHx​Fy​ ion-based plasma etching: An atomistic study with neural network potentials

Atomic energy mapping of neural network potential

Etching-to-deposition transition in SiO $_{2}$ /Si $_{3}$ N $_{4}$ using CH $_{x}$ F $_{y}$ ion-based plasma etching: An atomistic study with neural network potentials