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W. Cheng

3 papers here

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author1

Across the 1 of 3 papers where every author was matched, so the position is known.

fields
  • physics.app-ph3
same name
  • W. Cheng — 57 papers
  • W. Cheng — 9 papers
  • W. Cheng — 6 papers, h 17
  • W. Cheng — 4 papers
  • W. Cheng — 2 papers, h 7
  • W. Cheng — 2 papers, h 2

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

most citedSilicon Nitride Stress Liner Impacts on the Electrical Characteristics of AlGaN/GaN HEMTs

1 citations · 1 across the 1 of their papers we have counts for

collaborators

3 papers

physics.app-ph2019

Threshold Voltage Improvement and Leakage Reduction of AlGaN/GaN HEMTs Using Dual-Layer SiNx Stressors

Wei-Chih Cheng, Minghao He, Siqi Lei +9

In this work, AlGaN/GaN HEMTs with dual-layer SiNx stressors (composed of a low-stress layer and a high-stress layer) were investigated. The low-stress padding layer solved the sur…

physics.app-ph2019

Oxygen-based digital etching of AlGaN/GaN structures with AlN as etch-stop layers

Jingyi Wu, Siqi Lei, Wei-Chih Cheng +5

O2-plamsa-based digital etching of Al0.25Ga0.75N with a 0.8 nm AlN spacer on GaN was investigated. At 40 W RF bias power and 40 sccm oxygen flow, the etch depth of Al0.25Ga0.75N wa…

physics.app-ph2019★ 1 cited

Silicon Nitride Stress Liner Impacts on the Electrical Characteristics of AlGaN/GaN HEMTs

Wei-Chih Cheng, Tao Fang, Siqi Lei +7

Due to the piezoelectric nature of GaN, the 2DEG in AlGaN/GaN HEMT could be engineered by strain. In this work, SiNx deposited using dual-frequency PECVD was used as a stressor. Th…

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