2 papers
physics.app-ph2019
Threshold Voltage Improvement and Leakage Reduction of AlGaN/GaN HEMTs Using Dual-Layer SiNx Stressors
Wei-Chih Cheng, Minghao He, Siqi Lei +9
In this work, AlGaN/GaN HEMTs with dual-layer SiNx stressors (composed of a low-stress layer and a high-stress layer) were investigated. The low-stress padding layer solved the sur…
physics.app-ph2019
Oxygen-based digital etching of AlGaN/GaN structures with AlN as etch-stop layers
Jingyi Wu, Siqi Lei, Wei-Chih Cheng +5
O2-plamsa-based digital etching of Al0.25Ga0.75N with a 0.8 nm AlN spacer on GaN was investigated. At 40 W RF bias power and 40 sccm oxygen flow, the etch depth of Al0.25Ga0.75N wa…