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Yu Zhang

1 paper hereh-index 8288 citations16 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author1

Across the 1 of 1 paper where every author was matched, so the position is known.

fields
  • physics.app-ph1
same name
  • Yu Zhang — 91 papers, h 38
  • Yu Zhang — 52 papers, h 51
  • Yu Zhang — 31 papers, h 27
  • Yu Zhang — 25 papers, h 9
  • Yu Zhang — 22 papers
  • Yu Zhang — 22 papers, h 18

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

most citedPatterning Sn-based EUV resists with low-energy electrons

1 citations · 1 across the 1 of their papers we have counts for

collaborators
Showing physics.app-phShow all

1 paper · 1 filter

physics.app-ph2019★ 1 cited

Patterning Sn-based EUV resists with low-energy electrons

Ivan Bespalov, Yu Zhang, Jarich Haitjema +5

Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.