most citedPatterning Sn-based EUV resists with low-energy electrons

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physics.app-ph2019★ 1 cited

Patterning Sn-based EUV resists with low-energy electrons

Ivan Bespalov, Yu Zhang, Jarich Haitjema +5

Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (…