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cs.CV2023
DevelSet: Deep Neural Level Set for Instant Mask Optimization
Guojin Chen, Ziyang Yu, Hongduo Liu +2
With the feature size continuously shrinking in advanced technology nodes, mask optimization is increasingly crucial in the conventional design flow, accompanied by an explosive gr…
cs.CV2023★ 1 cited
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns
Wenqian Zhao, Xufeng Yao, Ziyang Yu +4
Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine…