Effect of UHV annealing on morphology and roughness of sputtered $Si(111)-(7\times 7)$ surfaces

Jagadish Chandra Mahato, Anupam Roy, Rajib Batabyal +4

$A{r}^{+}$ ion has been used regularly for the cleaning of semiconductor, metal surfaces for epitaxial nanostructures growth. We have investigated the effect of low-energy $A{r}^{+}$ ion s…