1 citations · 1 across the 1 of their papers we have counts for
2 papers
physics.app-ph2020
XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy
Najmeh Sadegh, Maarten van der Geest, Jarich Haitjema +4
Inorganic molecular materials such as tin oxo cages are a promising generation of photoresists compatible with the demands of the recently developed Extreme UltraViolet (EUV) litho…
physics.app-ph2019★ 1 cited
Patterning Sn-based EUV resists with low-energy electrons
Ivan Bespalov, Yu Zhang, Jarich Haitjema +5
Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (…