26 citations · 54 across the 4 of their papers we have counts for
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cond-mat.mtrl-sci2021
Spatially-Modulated Silicon Interface Energetics via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina
Alex Henning, Johannes D. Bartl, Lukas Wolz +12
Atomic layer deposition (ALD) is a key technique for the continued scaling of semiconductor devices, which increasingly relies on reproducible and scalable processes for interface…
physics.app-ph2021★ 16 cited
Near ambient pressure photoelectron spectro-microscopy: from gas-solid interface to operando devices
Matteo Amati, Luca Gregoratti, Patrick Zeller +11
Near Ambient Pressure Scanning Photoelectron Microscopy adds to the widely used photoemission spectroscopy and its chemically selective capability two key features: (i) the possibi…