collaborators

1 paper

cond-mat.mtrl-sci2025

A reduced-temperature process for preparing atomically clean Si(100) and SiGe(100) surfaces with vapor HF

Luis Fabián Peña, Evan M. Anderson, John P. Mudrick +4

Silicon processing techniques such as atomic precision advanced manufacturing (APAM) and epitaxial growth require surface preparations that activate oxide desorption (typically >10…