extreme ultraviolet lithography 1gate set tomography 1quantum dot uniformity 1semiconductor manufacturing 1silicon spin qubits 1
From the 1 of 3 linked papers with an AI index.
3 papers
cond-mat.mes-hall2026
SiMOS quantum-dot spin qubits enabled by extreme-ultraviolet lithography
Thomas Van Caekenberghe, Paul Steinacker, Bart Raes +31
The authors fabricate silicon MOS spin qubits using extreme‑ultraviolet (EUV) lithography on 300 mm wafers and demonstrate sub‑nanometer gate control, high uniformity, and gate fid…
quant-ph2026
Understanding oxide-thickness-dependent variability in dense Si-MOS quantum dot arrays
Arne Loenders, Jacques Van Damme, Clement Godfrin +19
Achieving uniform and scalable control of semiconductor spin qubits remains a key challenge for large scale quantum computing. In this work, we investigate how gate oxide thickness…
quant-ph2025
A trilinear quantum dot architecture for semiconductor spin qubits
R. Li, V. Levajac, C. Godfrin +10
Semiconductor quantum dot spin qubits hold significant potential for scaling to millions of qubits for practical quantum computing applications, as their structure highly resembles…