works on
extreme ultraviolet lithography 1gate set tomography 1quantum dot uniformity 1semiconductor manufacturing 1silicon spin qubits 1

From the 1 of 1 linked paper with an AI index.

collaborators

1 paper

cond-mat.mes-hall2026

SiMOS quantum-dot spin qubits enabled by extreme-ultraviolet lithography

Thomas Van Caekenberghe, Paul Steinacker, Bart Raes +31

The authors fabricate silicon MOS spin qubits using extreme‑ultraviolet (EUV) lithography on 300 mm wafers and demonstrate sub‑nanometer gate control, high uniformity, and gate fid…