In situ etching of \b{eta}-Ga2O3 using tert-butyl chloride in an MOCVD system

Cameron A. Gorsak, Henry J. Bowman, Katie R. Gann +9

In this study, we investigate in situ etching of \b{eta}-Ga2O3 in a metal-organic chemical vapor deposition (MOCVD) system using tert-Butyl chloride (TBCl). We report the successfu…