activity
20182025
most citedStudy of SiGeSn/GeSn single quantum well towards high-performance all-group-IV optoelectronics

15 citations · 22 across the 6 of their papers we have counts for

collaborators

6 papers

physics.app-ph2025

Ge0.95Sn0.05 on Si avalanche photodiode with Spectral Response Cutoff at 2.14 micrometer

Justin Rudie, Xiaoxin Wang, Rajesh Kumar +9

GeSn-based avalanche photodiode (APD) operating in shortwave infrared (SWIR) wavelength was demonstrated in this work. A separate absorption and charge multiplication (SACM) struct…

cond-mat.mtrl-sci2024★ 2 cited

Monolithic Germanium Tin on Si Avalanche Photodiodes

Justin Rudie, Sylvester Amoah, Xiaoxin Wang +8

We demonstrate monolithically grown germanium-tin (GeSn) on silicon avalanche photodiodes (APDs) for infrared light detection. A relatively thinner Ge buffer design was adopted to…

physics.app-ph2020★ 15 cited

Study of SiGeSn/GeSn single quantum well towards high-performance all-group-IV optoelectronics

Grey Abernathy, Yiyin Zhou, Solomon Ojo +8

The recent progress on (Si)GeSn optoelectronic devices holds a great promising for photonic integration on the Si substrate. In parallel to the development of bulk devices, the (Si…

physics.app-ph2020★ 2 cited

Electrically injected GeSn lasers with peak wavelength up to 2.7 micrometer at 90 K

Yiyin Zhou, Solomon Ojo, Yuanhao Miao +15

GeSn lasers enable monolithic integration of lasers on the Si platform using all-group-IV direct-bandgap materials. Although optically pumped GeSn lasers have made significant prog…

physics.app-ph2020★ 3 cited

Electrically injected GeSn lasers on Si operating up to 100 K

Yiyin Zhou, Yuanhao Miao, Solomon Ojo +14

The significant progress of GeSn material development has enabled a feasible solution to the long-desired monolithically integrated lasers on the Si platform. While there are many…

cond-mat.mtrl-sci2018

UHV-CVD Growth of High Quality GeSn Using SnCl4: From Growth Optimization to Prototype Devices

P. C. Grant, W. Dou, B. Alharthi +9

The persistent interest of the epitaxy of group IV alloy GeSn is mainly driven by the demand of efficient light source that could be monolithically integrated on Si for mid-infrare…