works on

From the 2 of 21 linked papers with an AI index.

activity
20242026
collaborators
Showing cond-mat.mtrl-sciShow all

10 papers · 1 filter

cond-mat.mtrl-sci2026

Second-Order Optical Nonlinearity of AlScN Films Grown By Molecular Beam Epitaxy

Joongwon Lee, Thai-Son Nguyen, Len van Deurzen +8

The paper measures the second‑order optical nonlinearity of AlScN films grown by molecular beam epitaxy directly on nitrided c‑plane sapphire, finding a greatly enhanced d31 coeffi…

cond-mat.mtrl-sci2026

Dependence of the Mn sticking coefficient on Ga-rich, N-rich, and Ga/N-flux-free conditions in GaN grown by plasma-assisted molecular beam epitaxy

YongJin Cho, Changkai Yu, Huili Grace Xing +1

This brief report examines the influence of Ga/N flux conditions on Mn incorporation in GaN. Mn-doped GaN layers were grown at 680C by molecular beam epitaxy on a Ga-pola…

cond-mat.mtrl-sci2025

Low Resistance Non-Alloyed Ohmic Contacts to High Al Composition n-type AlGaN

Joseph E. Dill, Xianzhi Wei, Changkai Yu +6

Ohmic contacts to high (>70\%) Al content n-type AlGaN ultra-wide bandgap semiconductor layers in nitride electronic and photonic devices are typically fabricated by a…

cond-mat.mtrl-sci2025

Improved operating voltage in InGaN-capped AlGaN-based DUV LEDs on bulk AlN substrates

H-W S. Huang, S. Agrawal, D. Bhattacharya +2

Better wall plug efficiency of deep-ultraviolet light emitting diodes (DUV-LEDs) requires simultaneous low resistivity p-type and n-type contacts, which is a challenging problem. I…

cond-mat.mtrl-sci2025

Generalized quantum limits of electrical contact resistance and thermal boundary resistance

Alice Ho, Jashan Singhal, Deji Akinwande +2

The importance of electrical contact resistance and thermal boundary resistance has increased dramatically as devices are scaled to atomic limits. The use of a rich range of materi…

cond-mat.mtrl-sci2025

XHEMTs on Ultrawide Bandgap Single-Crystal AlN Substrates

Eungkyun Kim, Yu-Hsin Chen, Naomi Pieczulewski +4

AlN has the largest bandgap in the wurtzite III-nitride semiconductor family, making it an ideal barrier for a thin GaN channel to achieve strong carrier confinement in field-effec…