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cond-mat.mtrl-sci2025
Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists
Kevin M. Dorney, Ivan Pollentier, Fabian Holzmeier +11
Metal oxide resists (MORs) have shown great promise for high resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high volume manufac…
cond-mat.mtrl-sci2025
Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined Theoretical and Experimental Approach
Laura Galleni, Dhirendra P. Singh, Thierry Conard +5
Extreme ultraviolet (EUV) lithography has revolutionized high-volume manufacturing of nanoscale components, enabling the production of smaller, denser, and more energy efficient in…