3 papers
physics.plasm-ph2026
Non-invasive monitoring of process-relevant plasma parameters by Fiber PROES in capacitively coupled Ar/CF plasmas
Florian Beckfeld, Maximilian Ryppa, Constantin Neuroth +3
Monitoring changes of process-relevant plasma parameters, such as the electron density and ion flux to the wafer, is essential for the development and control of plasma processes.…
physics.plasm-ph2024
Electron dynamics and SiO2 etching profile evolution in capacitive Ar/CHF3 discharges driven by sawtooth-tailored voltage waveforms
Wan Dong, Liu-Qin Song, Yi-Fan Zhang +3
The electron dynamics and SiO2 etching profile evolution in capacitively coupled Ar/CHF3 plasmas driven by sawtooth-waveforms are investigated based on a one-dimensional fluid/Mont…
physics.plasm-ph2024
Electron dynamics and particle transport in capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms
Wan Dong, Zhuo-Yao Gao, Li Wang +5
One dimensional fluid/electron Monte Carlo simulations of capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms are performed as a function of the number of…