2 papers
physics.plasm-ph2026
Non-invasive monitoring of process-relevant plasma parameters by Fiber PROES in capacitively coupled Ar/CF plasmas
Florian Beckfeld, Maximilian Ryppa, Constantin Neuroth +3
Monitoring changes of process-relevant plasma parameters, such as the electron density and ion flux to the wafer, is essential for the development and control of plasma processes.…
physics.plasm-ph2025
Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
Jonas Giesekus, Anton Pletzer, Florian Beckfeld +3
Precise control of ion energy distribution functions (IEDF) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In t…