activity
20142025
most citedBipolar High Power Impulse Magnetron Sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

48 citations · 146 across the 9 of their papers we have counts for

collaborators

9 papers

cond-mat.mtrl-sci2025★ 36 cited

Effect of substrate temperature on the deposition of Al-doped ZnO thin films using high power impulse magnetron sputtering

Martin Mickan, Ulf Helmersson, David Horwat

Al-doped ZnO thin films were deposited using reactive high power impulse magnetron sputtering at substrate temperatures between room temperature and 600 C. Two sample ser…

cond-mat.mtrl-sci2023★ 9 cited

Enhanced Thermoelectric Properties By Embedding Fe Nanoparticles Into CrN Films For Energy Harvesting Applications

Daria Pankratova, Khabib Yusupov, Alberto Vomiero +6

Nanostructured materials and nanocomposites have shown great promise for improving the efficiency of thermoelectric materials. Herein, Fe nanoparticles were imbedded into a CrN mat…

cond-mat.mes-hall2020

Nanowire design by magnetic collection of Fe, Ni and/or FeNi-alloy nanoparticles

Sebastian Ekeroth, Robert Boyd, Nils Brenning +1

A method for growing nanoparticles with different elemental compositions simply by changing pulsing parameters in a power supply is demonstrated. The technique is based on high pow…

physics.app-ph2019★ 48 cited

Bipolar High Power Impulse Magnetron Sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

Rommel Paulo B. Viloana, Jiabin Gub, Robert Boyda +3

The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investiga…

cond-mat.mtrl-sci2018

Low temperature (Ts/Tm < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate bias

Michelle Marie S. Villamayor, Julien Keraudy, Tetsuhide Shimizu +6

Low-temperature epitaxial growth of refractory transition-metal nitride thin films by means of physical vapor deposition has been a recurring theme in advanced thin-film technology…

cond-mat.mtrl-sci2018★ 6 cited

Nucleation of titanium nanoparticles in an oxygen-starved environment, II: Theory

Rickard Gunnarsson, Nils Brenning, Lars Ojamae +3

The nucleation and growth of pure titanium nanoparticles in a low-pressure sputter plasma has been believed to be essentially impossible. The addition of impurities, such as oxygen…

cond-mat.mtrl-sci2018★ 17 cited

Nucleation of titanium nanoparticles in an oxygen-starved environment, I: Experiments

Rickard Gunnarsson, Nils Brenning, Robert Deric Boyd +1

A constant supply of oxygen has been assumed to be necessary for the growth of titanium nanoparticles by sputtering. This oxygen supply can arise from a high background pressure in…

cond-mat.mes-hall2015★ 24 cited

Synthesis of titanium-oxide nanoparticles with size and stoichiometry control

Rickard Gunnarsson, Ulf Helmersson, Iris Pilch

Ti-O nanoparticles have been synthesized via hollow cathode sputtering in an Ar-O2 atmosphere using high power pulsing. It is shown that the stoichiometry and the size of the nanop…

cond-mat.mes-hall2014★ 6 cited

Molecular dynamics simulation of growth of Cu nanoclusters from Cu-ions in a plasma

Alexey A. Tal, E. Peter Müger, Igor A. Abrikosov +3

A recently developed method of nanoclusters growth in a pulsed plasma is studied by means of molecular dynamics. A model that allows one to consider high-energy charged particles i…