most citedBipolar High Power Impulse Magnetron Sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

48 citations · 48 across the 1 of their papers we have counts for

collaborators

1 paper

physics.app-ph2019★ 48 cited

Bipolar High Power Impulse Magnetron Sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

Rommel Paulo B. Viloana, Jiabin Gub, Robert Boyda +3

The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investiga…