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An upgraded ultra-high vacuum magnetron-sputtering system for high-versatility and software-controlled deposition
Arnaud le Febvrier, Ludvig Landalv, Thomas Liersch +3
Magnetron sputtering is a widely used physical vapor deposition technique. Reactive sputtering is used for the deposition of, e.g, oxides, nitrides and carbides. In fundamental res…
A general Lewis acidic etching route for preparing MXenes with enhanced electrochemical performance in non-aqueous electrolyte
Youbing Li, Hui Shao, Zifeng Lin +14
Two-dimensional carbides and nitrides of transition metals, known as MXenes, are a fast-growing family of 2D materials that draw attention as energy storage materials. So far, MXen…
Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering
Sharafat Ali, Biplab Paul, Roger Magnusson +5
In this work, amorphous thin films in Mg-Si-O-N system were prepared in order to investigate the dependence of optical and mechanical properties on Mg composition. Reactive RF magn…
Effect of impurities on morphology and growth mode of (111) and (001) epitaxial-like ScN films
Arnaud le Febvrier, Nina Tureson, Nina Stilkerich +2
ScN material is an emerging semiconductor with an indirect bandgap. It has attracted attention for its thermoelectric properties, use as seed layers, and for alloys for piezoelectr…
Effect of ion-implantation-induced defects and Mg dopants on thermoelectric properties of ScN
Nina Tureson, Marc Marteau, Thierry Cabioch +10
For applications in energy harvesting, environmentally friendly cooling, and as power sources in remote or portable applications, it is desired to enhance the efficiency of thermoe…