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N. Rassoul

4 papers hereh-index 16966 citations69 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author3

Across the 3 of 4 papers where every author was matched, so the position is known.

fields
  • cond-mat.mtrl-sci3
  • physics.app-ph1
same name
  • N. Rassoul — 1 paper, h 0

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

collaborators

4 papers

cond-mat.mtrl-sci2025

Impact of Mechanical Stress on IGZO TFTs: Enhancing PBTI Degradation

K. Vishwakarma, K. Lee, A. Kruv +8

This study investigates the impact of out-of-plane compressive mechanical stress (MS) on the performance and reliability of n-channel IGZO thin film transistors (TFTs). It is demon…

physics.app-ph2025

The impact of process steps on nearly ideal subthreshold slope in 300-mm compatible InGaZnO TFT

Hongwei Tang, Dennis Lin, Subhali Subhechha +14

While we demonstrate a back-gated (BG) amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) transistors with a nearly ideal subthreshold slope (SS) ~ 60 mV/dec. However, SS degrades when a…

cond-mat.mtrl-sci2025

In-poor IGZO: superior resilience to hydrogen in forming gas anneal and PBTI

A. Kruv, M. J. van Setten, A. Chasin +12

Integrating In-Ga-Zn-oxide (IGZO) channel transistors in silicon-based ecosystems requires the resilience of the channel material to hydrogen treatment. Standard IGZO, containing 4…

cond-mat.mtrl-sci2024

Sub-40mV Sigma-VTH IGZO nFETs in 300mm Fab

Jerome Mitard, Luka Kljucar, Nouredine Rassoul +19

Back and double gate IGZO nFETs have been demonstrated down to 120nm and 70nm respectively leveraging 300mm fab processing. While the passivation of oxygen vacancies in IGZO is cha…

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