2 papers
physics.app-ph2025
CFD Modelling and Sensitivity-Guided Design of Silicon Filament CVD Reactors
G. P. Gakis, G. LoachamÃn-Suntaxi, I. G. Aviziotis +6
Filament-based chemical vapor deposition (CVD) for silicon (Si) coatings is often treated as a straightforward adaptation of planar deposition, just with a cylindrical substrate. B…
physics.chem-ph2024
Discovering deposition process regimes: leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis
Geremy LoachamÃn Suntaxi, Paris Papavasileiou, Eleni D. Koronaki +8
This work introduces a comprehensive approach utilizing data-driven methods to elucidate the deposition process regimes in Chemical Vapor Deposition (CVD) reactors and the interpla…