24 citations · 125 across the 9 of their papers we have counts for
5 papers · 1 filter
An efficient approach to global sensitivity analysis and parameter estimation for line gratings
Nando Farchmin, Martin Hammerschmidt, Philipp-Immanuel Schneider +4
Scatterometry is a fast, indirect and nondestructive optical method for the quality control in the production of lithography masks. Geometry parameters of line gratings are obtaine…
Nanopatterned Sapphire Substrates in Deep-UV LEDs: Is there an Optical Benefit?
Phillip Manley, Sebastian Walde, Sylvia Hagedorn +3
Light emitting diodes (LEDs) in the deep ultra-violet (DUV) offer new perspectives for multiple applications ranging from 3D printing to sterilization. However, insufficient light…
Extracting Dimensional Parameters of Gratings Produced with Self-Aligned Multiple Patterning Using GISAXS
Mika Pflüger, R. Joseph Kline, Analía Fernández Herrero +3
Background: To ensure consistent and high-quality semiconductor production at future logic nodes, additional metrology tools are needed. For this purpose, grazing-incidence small-a…
Modal analysis for nanoplasmonics with nonlocal material properties
Felix Binkowski, Lin Zschiedrich, Martin Hammerschmidt +1
Plasmonic devices with feature sizes of a few nanometers exhibit effects which can be described by the nonlocal hydrodynamic Drude model. We demonstrate how to exploit contour inte…
Using Gaussian process regression for efficient parameter reconstruction
Philipp-Immanuel Schneider, Martin Hammerschmidt, Lin Zschiedrich +1
Optical scatterometry is a method to measure the size and shape of periodic micro- or nanostructures on surfaces. For this purpose the geometry parameters of the structures are obt…