Diffusional Relaxation in Random Sequential Deposition
arXiv:cond-mat/9610181 · doi:10.1088/0305-4470/30/9/003
Abstract
The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expression for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.
9 pages + 2 figures