Thermoelectric transport perpendicular to thin film heterostructures using Monte Carlo technique
arXiv:cond-mat/0610056 · doi:10.1103/PhysRevB.74.195331
Abstract
The Monte Carlo technique is used to calculate electrical as well as thermoelectric transport properties across thin film heterostructures. We study a thin InGaAsP barrier layer sandwiched between two InGaAs contact layers, when the barrier thickness is in 50nm-2000nm range. We found that with decreasing size, the effective Seebeck coefficient is increased substantially. The transition between pure ballistic thermionic transport and fully diffusive thermoelectric transport is also described.
Cited by in corpus (7)
- Design of efficient vdW thermionic heterostructures from first principles
- Monte Carlo Simulation of Electron Transport in Degenerate Semiconductors
- Hierarchically nanostructured thermoelectric materials: Challenges and opportunities for improved power factors
- Computationally efficient Monte Carlo electron transport algorithm for nanostructured thermoelectric material configurations
- Electron Monte Carlo Simulations of Nanoporous Si Thin Films -- The Influence of Pore-Edge Charges
- Energetic optimization effects in single resonant tunneling --nanoconverters
- Going beyond Landauer scattering theory to describe spatially-resolved non-local heating and cooling in quantum thermoelectrics