Thermoelectric transport perpendicular to thin film heterostructures using Monte Carlo technique
arXiv:cond-mat/0610056 · doi:10.1103/PhysRevB.74.195331
Abstract
The Monte Carlo technique is used to calculate electrical as well as thermoelectric transport properties across thin film heterostructures. We study a thin InGaAsP barrier layer sandwiched between two InGaAs contact layers, when the barrier thickness is in 50nm-2000nm range. We found that with decreasing size, the effective Seebeck coefficient is increased substantially. The transition between pure ballistic thermionic transport and fully diffusive thermoelectric transport is also described.