Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies
arXiv:cond-mat/0512283 · doi:10.1063/1.2711785
Abstract
Focused-ion-beam milling is used to fabricate nanostencil masks suitable for the fabrication of magnetic nanostructures relevant for spin transfer torque studies. Nanostencil masks are used to define the device dimensions prior to the growth of the thin film stack. They consist of a wet etch resistant top layer and an insulator on top of a pre-patterned bottom electrode. The insulator supports a hard mask and gives rise to an undercut by its selective etching. The approach is demonstrated by fabricating current perpendicular to the plane Co/Cu/Co nanopillar junctions, which exhibit current-induced magnetization dynamics.
13 pages, 3 figures, submitted to APL
References in corpus (11)
- Microwave Oscillations of a Nanomagnet Driven by a Spin-Polarized Current
- Current-driven Magnetization Reversal and Spin Wave Excitations in Co/Cu/Co Pillars
- Direct-Current Induced Dynamics in Co90Fe10/Ni80Fe20 Point Contacts
- Current-Driven Magnetic Excitations in Permalloy-Based Multilayer Nanopillars
- Current-induced spin-wave excitations in a single ferromagnetic layer
- Theory of Current-Induced Magnetization Precession
- Current-induced transverse spin wave instability in a thin nanomagnet
- Inflection point in the magnetic field dependence of the ordered moment of URu2Si2 observed by neutron scattering in fields up to 17 T
- Current Induced Excitations in Cu/Co/Cu Single Ferromagnetic Layer Nanopillars
- Current-induced macrospin vs spin-wave excitations in spin valves
- Current induced transverse spin-wave instability in thin ferromagnets: beyond linear stability analysis