How ripples turn into dots: modeling ion-beam erosion under oblique incidence
arXiv:cond-mat/0509437 · doi:10.1209/epl/i2006-10349-4
Abstract
Pattern formation on semiconductor surfaces induced by low energetic ion-beam erosion under normal and oblique incidence is theoretically investigated using a continuum model in form of a stochastic, nonlocal, anisotropic Kuramoto-Sivashinsky equation. Depending on the size of the parameters this model exhibits hexagonally ordered dot, ripple, less regular and even rather smooth patterns. We investigate the transitional behavior between such states and suggest how transitions can be experimentally detected.
arXiv comment11 pages, 4 figures, submitted for publication, revised version
References in corpus (5)
- Dynamic Scaling of Ion-Sputtered Surfaces
- Self-Organized Ordering of Nanostructures Produced by Ion-Beam Sputtering
- Dynamics of ripple formation in sputter erosion: nonlinear phenomena
- Kinetic Roughening of Ion-Sputtered Pd(001) Surface: Beyond the Kuramoto-Sivashinsky Model
- On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity