Reply to ``Comment on `Insulating Behavior of $λ$-DNA on the Micron Scale' "

Y. Zhang; R. H. Austin; E. C. Cox; N. P. Ong

doi:10.1103/PhysRevLett.93.239802

paper

Reply to ``Comment on `Insulating Behavior of $λ$ -DNA on the Micron Scale' "

arXiv:cond-mat/0412251 · doi:10.1103/PhysRevLett.93.239802

Abstract

In our experiment, we found that the resistance of vacuum-dried $λ$ -DNA exceeds $1 0^{14} Ω$ at 295 K. Bechhoefer and Sen have raised a number of objections to our conclusion. We provide counter arguments to support our original conclusion.

1 page reply to comment, 1 figure

Reply to ``Comment on `Insulating Behavior of λ-DNA on the Micron Scale' "

Abstract

Reply to ``Comment on `Insulating Behavior of $λ$ -DNA on the Micron Scale' "