Experimental Persistence Probability for Fluctuating Steps

Abstract

The persistence behavior for fluctuating steps on the $Si(111)$ $(\sqrt{3}\times \sqrt{3})R30^0-Al$ surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970K. The measured persistence probability follows a power law decay with an exponent of $\theta =0.77\pm 0.03$. This is consistent with the value of $\theta =3/4$ predicted for attachment/detachment limited step kinetics. If the persistence analysis is carried out in terms of return to a fixed reference position, the measured persistence probability decays exponentially. Numerical studies of the Langevin equation used to model step motion corroborate the experimental observations.

LaTeX, 11 pages, 4 figures, minor changes in References section

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