Diblock copolymer thin films: Parallel and perpendicular lamellar phases in the weak segregation limit
arXiv:cond-mat/0105213 · doi:10.1007/s101890170044
Abstract
We study morphologies of thin-film diblock copolymers between two flat and parallel walls. The study is restricted to the weak segregation regime below the order-disorder transition temperature. The deviation from perfect lamellar shape is calculated for phases which are perpendicular and parallel to the walls. We examine the undulations of the inter material dividing surface and its angle with the walls, and find that the deviation from its unperturbed position can be much larger than in the strong segregation case. Evaluating the weak segregation stability of the lamellar phases, it is shown that a surface interaction, which is quadratic in the monomer concentration, favors the perpendicular lamellar phase. In particular, the degeneracy between perpendicular and unfrustrated parallel lamellar phases for walls without a preferential adsorption is removed.
10 pages, 9 figures, submitted to European Physical Journal E
Cited by in corpus (10)
- Thin Film Diblock Copolymers in Electric Field: Transition from Perpendicular to Parallel Lamellae
- Microphase morphology in two dimensional fluids under lateral confinement
- Microphase separation in thin block copolymer films: a weak segregation mean-field approach
- Block Copolymer at Nano-Patterned Surfaces
- Organization of Block Copolymers using NanoImprint Lithography: Comparison of Theory and Experiments
- Lamellar Diblock Copolymers on Rough Substrates: Self-consistent Field Theory Studies
- Influence of substrate interaction and confinement on electric field induced transition in symmetric block copolymer thin films
- Coarse Graining in Block Copolymer Films
- Orienting thin films of lamellar block copolymer: the combined effect of mobile ions and electric field
- Interfacial Phenomena of Solvent-diluted Block Copolymers