Unusual scaling for pulsed laser deposition

Abstract

We demonstrate that a simple model for pulsed laser deposition exhibits an unusual type of scaling behavior for the island density in the submonolayer regime. This quantity is studied as function of pulse intensity and deposition time. We find a data collapse for the ratios of the logarithms of these quantities, whereas conventional scaling as observed in molecular beam epitaxy involves ratios of powers.

RevTex, 4 pages, 4 eps figures

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