Electron Doping of Thin Films: Candidate Metal Dopants and Their Potential Impact on Superconductivity
arXiv:2605.30297
Abstract
The bilayer Ruddlesden-Popper nickelate has emerged as a promising platform for exploring and understanding high-temperature superconductivities. While existing doping studies have primarily concentrated on hole doping achieved through strontium substitution or oxygen content tuning, the electron-doped regime in this system remains largely unexplored. In this work, we systematically investigate possible electron doping in thin films through tetravalent element substitution, employing first-principles density functional theory calculations. Our results suggest that (Ce) doping is inefficient in introducing electron carriers into the low-energy bands. In contrast, zirconium (Zr), hafnium (Hf), and thorium (Th) emerge as efficient electron donors. We show that Zr and Hf doping preferentially introduce electrons into the -derived bands, while Th doping delivers more electrons into the -derived bands. Electron dopings notably augment the interlayer hopping between orbitals, which could enhance superexchange coupling and consequently promote an increase in superconducting . We evaluate the Coulomb interaction parameters using constrained random phase approximation. Our results identify viable dopants for achieving electron-doped , which not only diversifies the material family but also provides new platforms for disentangling the origins of superconductivity.
12 pages, 11 figures